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Search Publications by: Kristen Dill ()

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Displaying 1 - 8 of 8

NIST Special Publication 376, Metric Ruler

August 8, 2024
Author(s)
Elizabeth Benham, Kristen Dill
NIST SP 376, Metric Ruler is an educational tool designed to teach the International System of Units (SI) length measurements. The design includes approximate scales of 300 mm and 30 cm. One edge is graduated in centimeters by alternating solid markings in

Metric Conversion Card

August 2, 2024
Author(s)
Elizabeth Benham, Kristen Dill
NIST SP 365, Metric Conversion Card is a laminated wallet size card includes an 8 cm and 80 mm ruler with approximate unit conversion factors between common International System of Units (SI) and U.S. customary measurement units for length, area, mass

SI Base Units Relationships Poster

March 3, 2020
Author(s)
Eite Tiesinga, Kristen A. Dill, David B. Newell
This publication is a colorful poster illustrating the relationships of the International System of Units (SI) derived units with special names and symbols and the seven traditional base units. The diagram is aligned with the BIPM SI Brochure, 9th edition

Nanolithography Toolbox

October 19, 2016
Author(s)

Bojan R. Ilic, Krishna Coimbatore Balram, Daron A. Westly, Marcelo I. Davanco, Karen E. Grutter, Qing Li, Thomas Michels, Christopher H. Ray, Liya Yu, Neal A. Bertrand, Samuel M. Stavis, Vladimir A. Aksyuk, James A. Liddle, Brian A. Bryce, Nicolae Lobontiu, Yuxiang Liu, Meredith Metzler, Gerald Lopez, David Czaplewski, Leonidas Ocola, Pavel Neuzil, Vojtech Svatos, Slava Krylov, Christopher B. Wallin, Ian J. Gilbert, Kristen A. Dill, Richard J. Kasica, Kartik A. Srinivasan, Gregory Simelgor, Juraj Topolancik

The Nanolithography Toolbox

October 19, 2016
Author(s)
Krishna Coimbatore Balram, Daron Westly, Marcelo I. Davanco, Karen E. Grutter, Qing Li, Thomas Michels, Christopher H. Ray, Richard Kasica, Christopher B. Wallin, Ian J. Gilbert, Brian A. Bryce, Gregory Simelgor, Juraj Topolancik, Nicolae Lobontiu, Yuxiang Liu, Pavel Neuzil, Vojtech Svatos, Kristen A. Dill, Neal A. Bertrand, Meredith Metzler, Gerald Lopez, David Czaplewski, Leonidas Ocola, Kartik Srinivasan, Samuel Stavis, Vladimir Aksyuk, James Alexander Liddle, Slava Krylov, Robert Ilic
This article describes a platform-independent software package for scripted lithography pattern layout generation and complex processing. The Nanolithography Toolbox, developed at the Center for Nanoscale Science and Technology (CNST) at the National
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