Publications

Displaying 26 - 28 of 28

NIST High Resolution X-Ray Diffraction Standard Reference Material: SRM 2000

October 30, 2009

Author(s)

Donald A. Windover, David L. Gil, Albert Henins, James P. Cline

NIST recently released a standard reference material (SRM) for the calibration of high resolution X-ray diffraction (HRXRD) instruments. HRXRD is extensively used in the characterization of lattice distortion in thin single, epitaxial crystal layers on

Characterization of Atomic Layer Deposition Using X-Ray Reflectrometry

November 13, 2005

Author(s)

Donald A. Windover, N G. Armstrong, James P. Cline, P Y. Hung, A C. Diebold

This work addresses current limitations of X-ray reflectometry (XRR) for modeling thin films and provides a basis for their improvement. Better accuracy in the characterization of novel thin film structures requires better model selection techniques and

Thickness measurement of nm HfO2 films

January 1, 2001

Author(s)

Kyung Joong KIM, A Kim, S.C. Kim, S.W. Song, H. Ruh, W.E.S. Unger, J. Radnik, J. Mata-Salazar, J.M. Juarez-Garcia, O. Cortazar-Martinez, A. Herrera-Gomez, P.E. Hansen, J.S. Madsen, C.A. Senna, B.S. Archanjo, J.C. Damasceno, C.A. Achete, H. Wang, M. Wang, Donald Windover, Eric B. Steel, A. Kurokawa, T. Fujimoto, Y. Azuma, S. Terauchi, L. Zhang, W.A. Jordaan, S.J. Spencer, A.G. Shard, L. Koenders, M. Krumrey, I. Busch, C. Jeynes

A pilot study for the thickness measurement of HfO2 films was performed by the Surface Analysis Working Group (SAWG) of the Consultative Committee for Amount of Substance (CCQM). The aim of this pilot study was to ensure the equivalency in the measurement

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