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Search Publications by: Vivek M. Prabhu (Fed)

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Displaying 201 - 223 of 223

Interdiffision in Polystyrene and End-Functional Polystyrene Thin Films Near a Solid Surface

September 10, 2003
Author(s)
Chengqing C. Wang, Vivek M. Prabhu, Christopher L. Soles, B D. Vogt, Wen-Li Wu, Eric K. Lin, Sushil K. Satija
Polymer interdiffusion near the polymer/solid interface is studied using neutron reflectometry. Bilayers of hydrogenated polystyrene (hPS) and deuterated polystyrene (dPS) or hydrogenated dicarboxy terminated polystyrene (hPS(COOH)2) and dPS are prepared

Form of Deprotection in Chemically Amplified Resists

September 1, 2003
Author(s)
Ronald L. Jones, T J. Hu, Vivek M. Prabhu, Christopher L. Soles, Eric K. Lin, Wen-Li Wu, D L. Goldfarb, M Angelopoulos
The push to mass production of patterns with sub-100 nm dimensions will require nanometer level control of feature size, including line edge roughness (LER). Control of LER and sidewall roughness within the length scale of individual molecules requires a

Interdiffusion in Polystyrene and End-Functional Polystyrene Thin Films Near a Solid Surface

September 1, 2003
Author(s)
C M. Wang, Vivek Prabhu, Christopher Soles, B D. Vogt, Wen-Li Wu, Eric K. Lin, Sushil K. Satija
Polymer interdiffusion near the polymer/solid interface is studied using neutron reflectometry. Bilayers of hydrogenated polystyrene (hPS) and deuterated polystyrene (dPS) or hydrogenated dicarboxy terminated polystyrene (hPS(COOH)2) and dPS are prepared

Polyelectrolyte Effects in Model Photoresist Developer Solutions

August 1, 2003
Author(s)
Vivek M. Prabhu, Ronald L. Jones, Eric K. Lin, Wen-Li Wu
We demonstrate that the industrially relevant deprotected photoresist poly(4-hydroxy styrene) is a polyelectrolyte when dissolved in aqueous base solutions. These findings demonstrate the well-known monomer-monomer correlations indicative of

Deprotection Volume Characteristics and Line Edge Morphology in Chemically Amplified Resists

June 1, 2003
Author(s)
Ronald L. Jones, C G. Willson, T J. Hu, Vivek M. Prabhu, Christopher L. Soles, Eric K. Lin, Wen-Li Wu, D L. Goldfarb, M Angelopoulos, B C. Trinque
The focus of this paper is the form of spatial heterogeneity of deprotection at the eventual pattern edge. The form results from the packing of fuzzy blobs consisting of volumes of deprotection created by individual photogenerated acids. The form and size

Chemically Amplified Resist Fundamentals Studies by Combinatorial approaches

March 1, 2003
Author(s)
M Wang, Vivek Prabhu, Eric K. Lin, Michael J. Fasolka, Alamgir Karim
Sub-100 nm lithography requires more understanding of photoresist material properties and processing conditions to achieve necessary critical dimension control of patterned structures. As resist thickness and feature linewidth decrease, fundamental

Polymer Dynamics and Diffusive Properties in Ultra-Thin Photoresist Films

February 1, 2003
Author(s)
Christopher L. Soles, Ronald L. Jones, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Vivek M. Prabhu, Wen-Li Wu, Eric K. Lin, D L. Goldfarb, M Angelopoulos
A series of experiments are presented to demonstrate thin film confinement effects on the diffusive properties in poly(tert-butoxycarboxystyrene) (PBOCSt). Bilayer diffusion couple measurements reveal that as the thickness of a PBOCSt film is decreased

Reaction Front Induced Roughness in Chemically Amplified Photoresists

August 1, 2002
Author(s)
Vivek Prabhu, Ronald L. Jones, Eric K. Lin, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Christopher Soles, Wen-Li Wu, D L. Goldfarb, M Angelopoulos
We have examined, with tapping mode atomic force microscopy(AFM), the effect of post-exposure bake times and developer on surface roughness using model bilayer interfaces of deuterium-labeled poly(tert-butyloxycarbonyloxy styrene) and poly(hydroxystyrene)
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