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Search Publications by Jennifer R Verkouteren

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Displaying 1 - 25 of 36

A Standards and Measurement Infrastructure for Calibration, Verification and Optimization of Trace Explosives Detection Systems

Author(s)
John G. Gillen, Jennifer R. Verkouteren, R M. Verkouteren, Marcela N. Najarro, Edward R. Sisco, Matthew E. Staymates, Jessica L. Staymates, Robert A. Fletcher, Jeffrey A. Lawrence, Elizabeth L. Robinson, Alexander T. Bulk, Joseph A. Bennett, Shinichiro Muramoto, Thomas P. Forbes
Current national priorities in homeland security have led to an unprecedented level of utilization of explosives trace detection (ETD) systems for

Method to Determine Collection Efficiency of Particles by Swipe Sampling

Author(s)
Jennifer R. Verkouteren, Jessica L. Staymates, Robert A. Fletcher, Wayne Smith, George A. Klouda, John G. Gillen
A methodology was developed to evaluate particle collection efficiencies from swipe sampling of trace residues. Swipe sampling is used for many applications

Verification of a Gas Mask Calibrant

Author(s)
Robert A. Fletcher, Jiann C. Yang, George W. Mulholland, R L. King, Michael R. Winchester, D Klinedinst, Jennifer R. Verkouteren, Thomas G. Cleary, David Buckingham, James J. Filliben

New Guidelines for d13C Measurements

Author(s)
T Coplen, W A. Brandt, M Gehre, Manfred Groning, HAJ Meijer, Blaza Toman, Jennifer R. Verkouteren
Consistency of 13C measurements can be improved 39-47% by anchoring the 13C scale with two isotopic referencematerials differing substantially in 13C/12C. It

IMS-Based Trace Explosives Detectors for First Responder Use

Author(s)
Jennifer R. Verkouteren, John G. Gillen, R M. Verkouteren, Robert A. Fletcher, E S. Etz, George A. Klouda, Alim A. Fatah, Philip J. Mattson
The purpose of this document is to establish minimum performance requirements and an associated test method for Ion Mobility Spectrometry (IMS) based trace

Automated Analysis of Organic Particles Using Cluster SIMS

Author(s)
John G. Gillen, Cynthia J. Zeissler, Christine M. Mahoney, Abigail P. Lindstrom, Robert A. Fletcher, P Chi, Jennifer R. Verkouteren, David S. Bright, R Lareau, M Boldman
Cluster primary ion bombardment combined with secondary ion imaging is used in an ion microscope secondary ion mass spectrometer for the spatially resolved

Bevel Depth Profiling SIMS for Analysis of Layer Structures

Author(s)
John G. Gillen, Scott A. Wight, P Chi, Albert J. Fahey, Jennifer R. Verkouteren, Eric S. Windsor, D. B. Fenner
We are evaluating the use of bevel depth profiling Secondary Ion Mass Spectrometry (SIMS) for the characterization of layered semiconductor materials. In this