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Search Publications by: William F Guthrie (Assoc)

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Displaying 126 - 150 of 192

NIST 3 Megawatt Quantitative Heat Release Rate Facility (NIST SP 1007)

December 1, 2003
Author(s)
Rodney A. Bryant, Thomas J. Ohlemiller, Erik L. Johnsson, Anthony P. Hamins, B S. Grove, William F. Guthrie, Alexander Maranghides, George W. Mulholland
The 3 Megawatt Heat Release Rate Facility was developed at NIST as a first step toward having broad capabilities for making quantitative large scale fire measurements. Such capabilities will be used at NIST to validate fire models and to develop sub-grid

Effects of Hydrolytic Degradation on In Vitro Biocompatibility of Poly (d,l-lactic)

May 20, 2003
Author(s)
S Yoneda, William F. Guthrie, D S. Bright, C A. Khatri, F W. Wang
In order to investigate the effects of hydrolytic degradation on the biocompatibility of poly(d,l-lactic acid) [P(d,l-LA)], the initial attachment of MC3T3-E1 osteoblast-like cells on various degraded P(d,l-LA) disks was assessed. MC3T3-E1 cells were

Combining Data in Small Multiple Method Studies

May 1, 2003
Author(s)
Robert C. Hagwood, William F. Guthrie
In this article an accurate confidence interval is derived when the results of a small number of different experimental methods are combined for the determination of an unknown quantity. ANOVA and a simple hierarchical Bayesian analysis of variance result

Reference Material 8457, Ultra High Molecular Weight Polyethylene 0.5 cm Cubes

May 1, 2003
Author(s)
B M. Fanconi, J A. Tesk, William F. Guthrie
The geometric and surface features of a new NIST reference material, RM 8457 are presented. This reference material is composed of Ultra High Molecular Weight Polyethylene (UHMWPE) in the form of 5 mm cubes. These cubes are intended for use in swelling

Test Structures for Referencing Electrical Linewidth Measurements to Silicon Lattice Parameters Using HRTEM

May 1, 2003
Author(s)
Richard A. Allen, B A. am Ende, Michael W. Cresswell, Christine E. Murabito, T J. Headley, William F. Guthrie, Loren W. Linholm, Colleen E. Hood, E. Hal Bogardus
A technique has been developed to determine the linewidths of the features of a prototype reference material for the calibration of CD (Critical-Dimension) metrology instruments. The reference features are fabricated in mono-crystalline-silicon with the

Reference Material 8457, Ultra High Molecular Weight Polyethylene 0.5 cm Cubes

April 1, 2003
Author(s)
B M. Fanconi, John A. Tesk, William F. Guthrie
The geometric and surface features of a new NIST reference material, RM 8457 are presented. This reference material is composed of Ultra High Molecular Weight Polyethylene (UHMWPE) in the form of 5 mm cubes. These cubesare intended for use in swelling

Detection Limit of Isotope Dilution Mass Spectrometry

August 1, 2002
Author(s)
Lee L. Yu, John D. Fassett, William F. Guthrie
The detection limit is an important figure of merit for evaluating instrumentation and analytical methods. While the detection limit for techniques using linear calibration functions has been studied extensively, this fundamental metric has rarely been

CD Reference Materials for Sub-Tenth Micrometer Applications

June 1, 2002
Author(s)
Michael W. Cresswell, E. Hal Bogardus, Joaquin (. Martinez, Marylyn H. Bennett, Richard A. Allen, William F. Guthrie, Christine E. Murabito, B A. am Ende, Loren W. Linholm
Prototype linewidth reference materials with Critical Dimensions (CDs) as narrow as 70 nm have been patterned in (110) silicon-on-insulator films. The sidewalls of the reference features are parallel, normal to the substrate surface, and have almost

Test Structures for Referencing Electronics Linewidth Measurements to Silicon Lattice Parameters Using HRTEM

April 8, 2002
Author(s)
Richard A. Allen, Michael W. Cresswell, Christine E. Murabito, William F. Guthrie, Loren W. Linholm, Colleen E. Hood, E. Hal Bogardus
A technique has been developed to certify the linewidths of the features of a prototype reference materials for the calibration of CD (Critical-Dimension) metrology instruments. The reference features are fabricated in mono-crystalline-silicon with the

Measurement of the Linewidth of Electrical Test-Structure Reference Features by Automated Phase-Contrast Image Analysis

April 1, 2002
Author(s)
B A. am Ende, Michael W. Cresswell, Richard A. Allen, T J. Headley, William F. Guthrie, Loren W. Linholm, H Bogardus, Christine E. Murabito
NIST, Sandia National Laboratories, and International SEMATECH are developing a new type of linewidth standard for calibrating Critical Dimension (CD) metrology instruments for lithographic process control. The standard reference feature is the bridge of