November 21, 2023
      
                  
        
  Author(s)
  Charles S.  Tarrio,   Steven  Grantham,   Rob  Vest,   Thomas A.  Germer,   Bryan  Barnes,   Stephanie  Moffitt,   Brian  Simonds,   Matthew  Spidell
 
       
            
    
    
        For several decades, the National Institute of Standards and Technology (NIST) has actively supported metrology programs for extreme ultraviolet (EUV) lithography. We will describe our existing programs in optics lifetime, reflectometry, and radiometry