April 17, 2009
Author(s)
Joseph C. Woicik, Maitri P. Warusawithana, Cheng Cen, Charles R. Sleasman, Yulan Li, Jeffery Kluga, Lena F. Kourkoutis, Hao Li, Li-Peng Wang, Michael Bedzyk, David A. Muller, Long-Qing Chen, Jeremy Levy, Darrell G. Schlom
Silicon and silicon dioxide form what is arguably the most important technological interface. With the end of Moore s-law scaling for silicon fast approaching, alternatives to silicon dioxide are being pursued that may enable new device architectures and