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Displaying 56126 - 56150 of 74175

Statistical Models for Estimating the Measurement of Pitch in Metrology Instruments

January 1, 1996
Author(s)
Nien F. Zhang, Michael T. Postek, Robert D. Larrabee
The measurement of pitch in metrology instruments is through to be a benign self-compensating function. In the course of issuing the new scanning electron microscope standard SRM 2090, a new algorithm for the measurement of pitch was developed. This is
Displaying 56126 - 56150 of 74175
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