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Displaying 53901 - 53925 of 74189

Application of Transmission Electron Detection to SCALPEL Mask Metrology

November 1, 1997
Author(s)
R Farrow, Michael T. Postek, William J. Keery, Samuel N. Jones, J R. Lowney, M Blakey, L Fetter, J Griffith, J E. Liddle, L C. Hopkins, H A. Huggins, M Peabody, A Novembre
Linewidth measurements were performed on a 4X scattering with angular limitation in projection electron lithography (SCALPEL) e-beam lithography mask using the transmitted electron signal in a modified scanning electron microscope. Features as small as 0

Application of Trasmission Electron Detection to Scalpel Mask Metrology

November 1, 1997
Author(s)
R Farrow, Michael T. Postek, William J. Keery, Samuel N. Jones, J R. Lowney, M Blakey, L Fetter, A Liddle, L C. Hopkins, H A. Huggins, M Peabody, A Novembre, J Griffith
Linewidth measurements were performed on a 4X scattering with angular limitation in projection electron lithography (SCALPEL) e-beam lithography mask using the transmitted electron signal in a modified scanning electron microscope. Features as small as 0

Applications of the Rapidly Renewable Lap

November 1, 1997
Author(s)
R E. Parks, E Robert, Christopher J. Evans, David J. Roderick, J David, John A. Dagata
The rapidly renewable lap is based on the simple concept of generating the figure needed in a lap substrate and then replicating it into a thin film slumped over the substrate. Based on this concept, we describe how efficient laps can be constructed for

Data Structures for the Fire Data Management System, FDMS 2.0 (NISTIR 6088)

November 1, 1997
Author(s)
Rebecca W. Portier, Richard Peacock, Paul A. Reneke
Fire Data Management System, FDMS, is a design for a computer database to store and retrieve fire test results obtained from bench-scale and real-scale tests as well as fire simulation programs. By storing available fire test values in a common format

Development of a Message Model to Support Integrated Design and Manufacturing

November 1, 1997
Author(s)
Venkat Allada, Shaw C. Feng, Steven R. Ray
Mere data sharing between engineering design systems and manufacturing systems does not represent an ideal integrated system. While data sharing represents an important aspect of an integrated design and manufacturing environment, an equally critical

Digital Recording and Analysis of Positive Partial Discharges in Air

November 1, 1997
Author(s)
Yicheng Wang, X. Han, Richard J. Van Brunt, J. C. Horwath, D. L. Schweickart
A new Surface-mediated burst mode of partial discharges is discovered in which a partial discharge pulse has a fixed probability to induce a following pulse, forming a burst of evenly separated pulses. The probability is determined for several gap voltages

Information Technology: The Fifth Text REtrieval Conference [TREC-5]

November 1, 1997
Author(s)
Ellen M. Voorhees, Donna K. Harman
This paper serves as an introduction to the research described in the remainder of the proceedings. It defines the common retrieval tasks performed in TREC-5, the test collections used, and the evaluation methodology. The overview of the retrieval results

Low-Temperature Elastic Coefficients of Polycrystalline Indium

November 1, 1997
Author(s)
K Sudook, H M. Ledbetter
Using an ultrasonic pulse-echo method, we measured the elastic coefficients of polycrystalline indium from 300 to 5K. All elastic coefficients showed regular temperature behavior, as predicted by an Einstein-oscillator model. The shear and Young moduli

Measurements of the LIGO Pathfinder Optics

November 1, 1997
Author(s)
R E. Parks, Christopher J. Evans, P Sullivan, Lianzhen Shao, B Loucks
A number of 150 mm apertures in 250 mm diameter plano-concave optics with figure errors of a few nm were carefully tested using phase measuring interferometry and the data reduced using pixel based absolute testing techniques. We discuss some of the data

Metal Capillaries for Neutron Lenses

November 1, 1997
Author(s)
P. L. Reeder, A. J. Peurrung, D. S. Sunberg, J. J. Stoffels, Huaiyu H. Chen-Mayer, David F. Mildner, V. A. Sharov, V. S. Fokin

Metrology of Scattering with Angular Limitation Projection Electron Lithography Masks

November 1, 1997
Author(s)
J E. Liddle, M Blakey, T Saunders, R Farrow, L Fetter, C Kneurek, R Kasica, et al, M Peabody, Shannon L. Takach, D L. Windt, Michael T. Postek
Mask metrology is a vital part of any lithographic technology, both for control of the mask patterning process and also for ensuring that the contribution of the mask to the system error budget is within acceptable limits. For design rules of 0.13 ?m and
Displaying 53901 - 53925 of 74189
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