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Search Publications

NIST Authors in Bold

Displaying 33751 - 33775 of 73697

Crack Tip Opening Angle: Measurement and Modeling of Fracture Resistance in Low and High Strength Pipeline Steels

September 1, 2006
Author(s)
Philippe P. Darcis, Joseph D. McColskey, Christopher N. McCowan, Thomas A. Siewert, Gabriel Kohn, Arry Bussiba, Richard J. Fields
Crack tip opening angle (CTOA) is becoming one of the more widely accepted properties for characterizing fully plastic fracture. In fact, it has been recognized as a measure of the resistance of a material to fracture, in cases where there is a large

Development and Evaluation of a Candidate Reference Measurement Procedure for the Determination of Progesterone in Human Serum Using Isotope-Dilution Liquid Chromatography-Tandem Mass Spectrometry

September 1, 2006
Author(s)
Susan S. Tai, Bei Xu, Michael J. Welch
Progesterone is a steroid hormone that is involved in regulating female reproductive processes. Its concentration in blood is measured to determine ovarian function. A candidate reference measurement procedure for progesterone in human serum involving

Development of NIST SRM 2881, an Absolute Molecular Mass Distribution Polymer Standard

September 1, 2006
Author(s)
William E. Wallace, Charles M. Guttman, Kathleen M. Flynn, Anthony J. Kearsley
We present a strategy to create an absolute molecular mass distribution polymer Standard Reference Material. To create a standard our methods must be free of operator bias (intentional or unintentional). The steps include sample preparation, instrument

Effect of Xenon Bombardment on Ruthenium-Coated Grazing Incidence Collector Mirror Lifetime for EUV Lithography

September 1, 2006
Author(s)
M Nieto, J P. Allain, V Titov, M R. Hendricks, A Hassanein, D Rokusek, C Chrobak, Charles Tarrio, Yaniv Barad, Steven Grantham, Thomas B. Lucatorto, Bryan Rice
The effect of energetic Xenon ion bombardment on the extreme ultraviolet (EUV) reflectivity performance of mirrors is of vital importance for the performance of discharge- and laser-produced plasma extreme ultraviolet lithography (EUVL) sources. To study

Fatigue Crack Growth Rates in Five Pipeline Steels

September 1, 2006
Author(s)
Arry Bussiba, Philippe P. Darcis, J D. McCloskey, Christopher N. McCowan, Thomas A. Siewert, Gabriel Kohn, R P. Smith, J. Merritt
This study presents fatigue data for six different pipeline steels, with strengths ranging from Grade B to X100. A fatigue crack growth test for full-thickness pipeline samples was developed using a Middle Tension (MT) type specimen. The six steels showed

Guide to Integrating Forensic Techniques into Incident Response

September 1, 2006
Author(s)
Timothy Grance, Suzanne Chevalier, Karen A. Scarfone, Hung Dang
This publication is intended to help organizations in investigating computer security incidents and troubleshooting some information technology (IT) operational problems by providing practical guidance on performing computer and network forensics. The

Guidelines for Media Sanitization

September 1, 2006
Author(s)
Richard L. Kissel, Matthew A. Scholl, Steven Skolochenko, Xiang Li
Information systems capture, process, and store information using a wide variety of media. This information is located not only on the intended storage media but also on devices used to create, process, or transmit this information. These media may require

HLPR Chair* - A Service Robot for the Healthcare Industry

September 1, 2006
Author(s)
Roger V. Bostelman, James S. Albus
The National Institute of Standards and Technology (NIST) Intelligent Systems Division (ISD) has been working on a healthcare mobility system capable of mobilizing wheelchair dependents, providing patient lift and even rehabilitation. Targeted at the aging

Illumination Optimization for Optical Semiconductor Metrology

September 1, 2006
Author(s)
Bryan M. Barnes, L Howard, Richard M. Silver
Uniform sample illumination via K hler illumination, is achieved by establishing a pair of conjugate focal planes; a light source is focused onto the condenser lens aperture while the image of the field aperture is focused at the plane of the specimen
Displaying 33751 - 33775 of 73697
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