March 25, 2016
Author(s)
Nadir S. Faradzhev, Shannon B. Hill
Previously we reported on the etch rates of C on TiO2 by oxidizers including NO, O3 and H2O2 when irradiated by extreme ultraviolet (EUV) radiation at 13.5 nm [Faradzhev et al., J.Phys. Chem. C, 117 (2013) 23072-23081]. We demonstrated that the intensity