Scanning Capacitance Microscopy Measurements and Modeling: Progress Towards Dopant Profiling of Silicon

Joseph Kopanski; Jay F. Marchiando; J R. Lowney

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PUBLICATIONS

Scanning Capacitance Microscopy Measurements and Modeling: Progress Towards Dopant Profiling of Silicon

Published

February 1, 1996

Author(s)

Joseph Kopanski, Jay F. Marchiando, J R. Lowney

Citation

Journal of Vacuum Science and Technology

Volume

B 14

Issue

Pub Type

Journals

Citation

Kopanski, J. , Marchiando, J. and Lowney, J. (1996), Scanning Capacitance Microscopy Measurements and Modeling: Progress Towards Dopant Profiling of Silicon, Journal of Vacuum Science and Technology (Accessed November 10, 2026)

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Created January 31, 1996, Updated October 12, 2021

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