A new method for in-situ fabrication of nanochannels is developed which allows adjusting their average pore size to an unprecedented range of 5 nm to 20 nm. It is shown that nanochannels with different but controlled pore sizes are selectively fabricated at known positions on the same surface. Equally important, nanochannels, either single or group, are addressable photolithographically and integrable to microchannels without the use of any high resolution lithography. Formation of nanochannels is examined by cross-sectional electron microscopy and energy-dispersive X-ray spectroscopy. This technique uses horizontal ZnO nanowires as template and provides the capability of parallel fabrication of nanofluidic platforms.
Citation: Chemistry of Materials
Pub Type: Journals
Nanochannel, Focused ion beam, nanowire, oriented assembly, Scalable fabrication