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Realizing suspended structures on chips fabricated by CMOS foundry processes through the MOSIS service:

Published

Author(s)

M Zaghloul, D Novotny, V Tyree, J -I Pi, C Pi��, W Hansford
Citation
- NIST IR 5402
Report Number
NIST IR 5402

Citation

Zaghloul, M. , Novotny, D. , Tyree, V. , Pi, J. , Pi��, C. and Hansford, W. (1994), Realizing suspended structures on chips fabricated by CMOS foundry processes through the MOSIS service:, , National Institute of Standards and Technology, Gaithersburg, MD, [online], https://doi.org/10.6028/NIST.IR.5402 (Accessed July 26, 2024)

Issues

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Created January 1, 1994, Updated May 19, 2023