Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Processing Methods for Selected Area Film Deposition and Preparation on Microsensor Platforms Using Thermal and Potential Control

Published

Author(s)

R M. Walton, Richard E. Cavicchi, C Kendrick, B Panchapakesan, Stephen Semancik

Abstract

In previous work we have used Si-based
Citation
International Conference on Solid State Sensors and Actuators
Volume
1

Keywords

chemical vapor deposition, electrochemical deposition, localized deposition, micromachined Si, microsensors

Citation

Walton, R. , Cavicchi, R. , Kendrick, C. , Panchapakesan, B. and Semancik, S. (1999), Processing Methods for Selected Area Film Deposition and Preparation on Microsensor Platforms Using Thermal and Potential Control, International Conference on Solid State Sensors and Actuators (Accessed May 18, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created January 1, 1999, Updated February 17, 2017