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Potential Stable Low-Permeation Rate Standard Based on Micro-machined Silicon



Grady S. White, Adrian Verwolf, Chris M. Poling, Nicholas Barbosa, Nikki S. Rentz


Silicon wafers with micro-machined holes were evaluated for use as low permeation standard artifacts. Accuracy, stability, and reliability were assessed. Two experimental techniques were used: chilled mirror hygrometer and mass loss. The wafers exhibited a well-defined linear relationship between hole area and resultant water partial pressure. In contrast to polymer permeation standards, Si wafers provided long-term reproducible permeation rates. However, they were also highly fragile, with half of them cracking during the course of the investigation.
Journal of Research (NIST JRES) -


permeation, standard, SRM, chilled mirror hygrometer


White, G. , Verwolf, A. , Poling, C. , Barbosa, N. and Rentz, N. (2015), Potential Stable Low-Permeation Rate Standard Based on Micro-machined Silicon, Journal of Research (NIST JRES), National Institute of Standards and Technology, Gaithersburg, MD, [online], (Accessed May 26, 2024)


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Created December 15, 2015, Updated November 14, 2018