Potential Stable Low-Permeation Rate Standard Based on Micro-machined Silicon
Grady S. White, Adrian Verwolf, Chris M. Poling, Nicholas Barbosa, Nikki S. Rentz
Silicon wafers with micro-machined holes were evaluated for use as low permeation standard artifacts. Accuracy, stability, and reliability were assessed. Two experimental techniques were used: chilled mirror hygrometer and mass loss. The wafers exhibited a well-defined linear relationship between hole area and resultant water partial pressure. In contrast to polymer permeation standards, Si wafers provided long-term reproducible permeation rates. However, they were also highly fragile, with half of them cracking during the course of the investigation.
, Verwolf, A.
, Poling, C.
, Barbosa, N.
and Rentz, N.
Potential Stable Low-Permeation Rate Standard Based on Micro-machined Silicon, Journal of Research (NIST JRES), National Institute of Standards and Technology, Gaithersburg, MD, [online], https://doi.org/10.6028/jres.120.021
(Accessed December 7, 2023)