White, G.
, Verwolf, A.
, Poling, C.
, Barbosa, N.
and Rentz, N.
(2015),
Potential Stable Low-Permeation Rate Standard Based on Micro-machined Silicon, Journal of Research (NIST JRES), National Institute of Standards and Technology, Gaithersburg, MD, [online], https://doi.org/10.6028/jres.120.021
(Accessed October 8, 2025)
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Potential Stable Low-Permeation Rate Standard Based on Micro-machined Silicon
Published
Author(s)
, Adrian Verwolf, , ,
Abstract
Silicon wafers with micro-machined holes were evaluated for use as low permeation standard artifacts. Accuracy, stability, and reliability were assessed. Two experimental techniques were used: chilled mirror hygrometer and mass loss. The wafers exhibited a well-defined linear relationship between hole area and resultant water partial pressure. In contrast to polymer permeation standards, Si wafers provided long-term reproducible permeation rates. However, they were also highly fragile, with half of them cracking during the course of the investigation.Citation
Journal of Research (NIST JRES) -
Volume
120
NIST Pub Series
Pub Type
NIST Pubs
Download Paper
Keywords
permeation, standard, SRM, chilled mirror hygrometer
Citation
Issues
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Created December 15, 2015, Updated November 14, 2018