Potential Energy Sputtering of EUVL Materials

Joshua M. Pomeroy; L P. Ratliff; John D. Gillaspy; Sasa Bajt

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PUBLICATIONS

Potential Energy Sputtering of EUVL Materials

Published

February 23, 2006

Author(s)

Joshua M. Pomeroy, L P. Ratliff, John D. Gillaspy, Sasa Bajt

Citation

SPIE

Volume

PM149

Pub Type

Journals

Keywords

electron beam ion trap (EBIT), euv light sources, euv lithography, highly charged ions, scanning tunneling microscopy, surface analysis, xenon

Citation

Pomeroy, J. , Ratliff, L. , Gillaspy, J. and Bajt, S. (2006), Potential Energy Sputtering of EUVL Materials, SPIE (Accessed July 14, 2026)

Additional citation formats

Issues

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Created February 23, 2006, Updated February 17, 2017

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