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Potential Energy Sputtering of EUVL Materials

Published

Author(s)

Joshua M. Pomeroy, L P. Ratliff, John D. Gillaspy, Sasa Bajt
Citation
SPIE
Volume
PM149

Keywords

electron beam ion trap (EBIT), euv light sources, euv lithography, highly charged ions, scanning tunneling microscopy, surface analysis, xenon

Citation

Pomeroy, J. , Ratliff, L. , Gillaspy, J. and Bajt, S. (2006), Potential Energy Sputtering of EUVL Materials, SPIE (Accessed July 17, 2024)

Issues

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Created February 23, 2006, Updated February 17, 2017