Pore Size Distributions in Low-k Dielectric Thin Films From SANS Porosimetry

Published

March 1, 2004

Author(s)

R C. Hedden, V. J. Lee, Christopher L. Soles, Barry J. Bauer

Abstract

A small-angle neutron scattering (SANS) porosimetry technique is presented for characterization of pore structure in nanoporous thin films. Porosimetry experiments are conducted using a contrast match solvent (a mixture of toluene-d8 and toluene-h8) having the same neutron scattering length density as that of the nanoporous film matrix. The film is exposed to contrast match toluene vapor in a carrier gas (air), and pores fill with liquid by capillary condensation. The partial pressure of the solvent vapor is increased stepwise from pure air to saturated solvent vapor, and then decreased stepwise to pure air. As the solvent partial pressure increases, pores fill with liquid solvent progressively from smallest to largest.

Proceedings Title

American Chemical Society Division of Polymeric Materials: Science and Engineering Meeting |227th | Proceedings of the ACS Division of Polymeric Materials: Science & Engineering | ACS

Volume

296

Issue

Pt. 2

Conference Dates

March 28-29, 2003

Conference Title

Abstracts of Papers - American Chemical Society

Pub Type

Conferences

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Local Download

Keywords

chord length, high concentration, pore, scattering, two-phase

Citation

Hedden, R. , Lee, V. , Soles, C. and Bauer, B. (2004), Pore Size Distributions in Low-k Dielectric Thin Films From SANS Porosimetry, American Chemical Society Division of Polymeric Materials: Science and Engineering Meeting |227th | Proceedings of the ACS Division of Polymeric Materials: Science & Engineering | ACS, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=852284 (Accessed October 13, 2024)