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PUBLICATIONS

Photomask Linewidth Measurement Uncertainty: An Alternative Approach via Stepper Emulation

Published

Author(s)

James E. Potzick

Abstract

The most significant contribution to uncertainty in the measurement of photomask linewidths is the rough shape of the edge of the etched chrome lines. This uncertainty can be greatly reduced if the emulated stepper aerial image of the feature is measured instead of its geometric linewidth. That is: measure what the photomask does, not what it is. Phase-shift and other kinds of mask can be measured in the same way.
Proceedings Title
Bacus News, SPIE
Volume
10(8)
Pub Type
Conferences

Keywords

aerial image emulation, linewidth, measurement uncertainty
Manufacturing and Metrology

Citation

Potzick, J. (1994), Photomask Linewidth Measurement Uncertainty: An Alternative Approach via Stepper Emulation, Bacus News, SPIE (Accessed October 4, 2024)

Issues

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Created January 1, 1994, Updated February 19, 2017