Potzick, J.
(1994),
Photomask Linewidth Measurement Uncertainty: An Alternative Approach via Stepper Emulation, Bacus News, SPIE
(Accessed June 14, 2025)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Photomask Linewidth Measurement Uncertainty: An Alternative Approach via Stepper Emulation
Published
Author(s)
Abstract
The most significant contribution to uncertainty in the measurement of photomask linewidths is the rough shape of the edge of the etched chrome lines. This uncertainty can be greatly reduced if the emulated stepper aerial image of the feature is measured instead of its geometric linewidth. That is: measure what the photomask does, not what it is. Phase-shift and other kinds of mask can be measured in the same way.Proceedings Title
Bacus News, SPIE
Volume
10(8)
Pub Type
Conferences
Keywords
aerial image emulation, linewidth, measurement uncertainty
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact [email protected].
Created January 1, 1994, Updated February 19, 2017