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Nondestructive measurement of the evolution of layer-specific mechanical properties in sub-10nm bilayer films

Published

Author(s)

Justin M. Shaw, Kathleen Hoogeboom-Pot, Jorge Hernandez-Charpak, Henry Kapteyn, Margaret Murnane, Damiano Nardi

Abstract

ABSTRACT: We use short-wavelength extreme-ultraviolet light to independently measure the mechanical properties of disparate layers within a bilayer film with single-monolayer sensitivity. We show that in Ni/Ta nanostructured systems, while their densities are not significantly changed from that expected in bulk, their elastic properties are significantly modified: nickel softens while tantalum stiffens relative to their bulk values. In particular, the presence or absence of the Ta capping layer influences the mechanical properties of the Ni film. This non-destructive nano-mechanical measurement technique represents the first approach to date able to distinguish the properties of composite materials well below 100 nm in thickness. This capability is critical for understanding and optimizing the strength, flexibility and reliability of materials in a host of nanostructured electronic, photovoltaic and thermoelectric devices.
Citation
Applied Physics Letters

Keywords

Ultrafast X-Rays, nanometrology, nano-mechanical properties, ultrathin films, nondiffusive thermal transport, mean free path spectroscopy, photoacoustic, photothermal

Citation

Shaw, J. , Hoogeboom-Pot, K. , Hernandez-Charpak, J. , Kapteyn, H. , Murnane, M. and Nardi, D. (2015), Nondestructive measurement of the evolution of layer-specific mechanical properties in sub-10nm bilayer films, Applied Physics Letters (Accessed June 22, 2024)

Issues

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Created April 21, 2015, Updated February 19, 2017