Postek, M.
, Larrabee, R.
and Keery, W.
(1989),
A New Approach to Accurate X-Ray Mask Measurements in a Scanning Electron Microscope, IEEE Transactions on Electron Devices
(Accessed May 9, 2025)
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A New Approach to Accurate X-Ray Mask Measurements in a Scanning Electron Microscope
Published
Author(s)
, ,
Citation
IEEE Transactions on Electron Devices
Volume
36
Issue
11
Pub Type
Journals
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created October 31, 1989, Updated October 12, 2021