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A New Approach to Accurate X-Ray Mask Measurements in a Scanning Electron Microscope

Published

Author(s)

Michael T. Postek, Robert D. Larrabee, William J. Keery
Citation
IEEE Transactions on Electron Devices
Volume
36
Issue
11

Citation

Postek, M. , Larrabee, R. and Keery, W. (1989), A New Approach to Accurate X-Ray Mask Measurements in a Scanning Electron Microscope, IEEE Transactions on Electron Devices (Accessed April 23, 2024)
Created October 31, 1989, Updated October 12, 2021