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A New Approach to Accurate X-Ray Mask Measurements in a Scanning Electron Microscope
Published
Author(s)
Michael T. Postek, Robert D. Larrabee, William J. Keery
Citation
IEEE Transactions on Electron Devices
Volume
36
Issue
11
Pub Type
Journals
Citation
Postek, M.
, Larrabee, R.
and Keery, W.
(1989),
A New Approach to Accurate X-Ray Mask Measurements in a Scanning Electron Microscope, IEEE Transactions on Electron Devices
(Accessed May 29, 2023)