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Nanometrology Using Through-Focus Scanning Optical Microscopy Method

Published

Author(s)

Ravikiran Attota, Richard M. Silver

Abstract

We present an initial review of a novel through-focus scanning optical microscopy (TSOM) imaging method that produces nanometer dimensional measurement sensitivity using a conventional bright-field optical microscope. In the TSOM method a target is scanned through the focus of an optical microscope, simultaneously acquiring optical images at different focal positions. The TSOM images are constructed using the through-focus optical images. A TSOM image is deemed unique under a given experimental condition and is sensitive to changes in the dimensions of a target in a distinct way. We use this characteristic for nanoscale dimensional metrology. This technique can be used to identify which dimension is changing between two nanosized targets and to determine the dimensions using a library-matching method. This methodology has potential utility for a wide range of target geometries and application areas, including, nanometrology, nanomanufacturing, defect analysis, process control, and biotechnology.
Citation
Measurement Science & Technology

Keywords

TSOM, Through focus, optical microscope, nanometrology, process control, nanomanufacturing, nanoparticles, overlay metrology, critical dimension, defect analysis, dimensional analysis, MEMS, NEMS

Citation

Attota, R. and Silver, R. (2011), Nanometrology Using Through-Focus Scanning Optical Microscopy Method, Measurement Science & Technology, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=905395 (Accessed June 17, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created December 21, 2011, Updated February 19, 2017