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Nanometer-Scale Metrology: Meeting the Nanotechnology Measurement Challenges

Published

Author(s)

Michael T. Postek

Abstract

NIST is responsible to U.S. industry for developing length intensive measurement capabilities and calibration standards in the nanometer scale regime. The Nanometer-Scale Metrology Program is an integrated Manufacturing Engineering Laboratory program composed of projects all aimed at accurate nano-length metrology. These projects range (in part) from scanning probe microscopies, optical microscopy, interferometry, scanning electron microscopy, and include traditional linescale interferometry which maintains the NIST capability for length scale measurements at a world-class level. The industrial relevancy of the research and standards provided by this program has resulted in a large number of industrial interactions.
Proceedings Title
Proceedings of SPIE, Nanostructure Science, Metrology, and Technology, Martin C. Peckerar, Michael T. Postek, Jr., Editors
Volume
4608
Conference Dates
September 5, 2001
Conference Location
Gaithersburg, MD
Conference Title
Metrological Science

Keywords

critical dimension, interferometry, linescale, lithography, proximal probe, scanned probe microscopy

Citation

Postek, M. (2002), Nanometer-Scale Metrology: Meeting the Nanotechnology Measurement Challenges, Proceedings of SPIE, Nanostructure Science, Metrology, and Technology, Martin C. Peckerar, Michael T. Postek, Jr., Editors, Gaithersburg, MD (Accessed May 28, 2024)

Issues

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Created July 1, 2002, Updated February 19, 2017