Nanofluidic Structures with Complex Three Dimensional Surfaces
Samuel M. Stavis, Elizabeth Strychalski, Michael Gaitan
A fabrication process was developed to construct nanofluidic devices with complex three dimensional (3D) topographies. A single layer of grayscale photolithography enabled arbitrary and simultaneous control of numerous nanoscale etch depths in a fused silica substrate, and glass wafer bonding was used to form enclosed nanofluidic structures with depths varying from (11 ± 4) nm to (624 ± 7) nm (μ ± σ). Fluorescent nanoparticles and biopolymers were manipulated in a 3D test structure.