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A Microelectronic Test Structure for Thickness Determination of Homogeneous Conducting Thin Films in VLSI Processing

Published

Author(s)

Jin S. Kim, Loren W. Linholm, B. L. Barley, M. H. Hanes, Michael W. Cresswell
Proceedings Title
Proc., IEEE International Conference on Microelectronic Test Structures
Conference Dates
February 22-23, 1988
Conference Location
Long Beach, CA, USA

Citation

Kim, J. , Linholm, L. , Barley, B. , Hanes, M. and Cresswell, M. (1988), A Microelectronic Test Structure for Thickness Determination of Homogeneous Conducting Thin Films in VLSI Processing, Proc., IEEE International Conference on Microelectronic Test Structures, Long Beach, CA, USA (Accessed March 4, 2024)
Created December 30, 1988, Updated October 12, 2021