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PUBLICATIONS

Metrology Standards For Advanced Semiconductor Lithography Referenced to Atomic Spacings and Geometry

Published

Author(s)

E C. Teague, Loren W. Linholm, Michael W. Cresswell, William B. Penzes, John A. Kramar, Fredric Scire, John S. Villarrubia, Jay S. Jun
Proceedings Title
Proc., IEEE International Conference on Microelectronic Test Structures
Conference Dates
March 22-25, 1993
Conference Location
Sitges, 1, SP
Pub Type
Conferences

Citation

Teague, E. , Linholm, L. , Cresswell, M. , Penzes, W. , Kramar, J. , Scire, F. , Villarrubia, J. and Jun, J. (1993), Metrology Standards For Advanced Semiconductor Lithography Referenced to Atomic Spacings and Geometry, Proc., IEEE International Conference on Microelectronic Test Structures, Sitges, 1, SP (Accessed December 3, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created December 30, 1993, Updated October 12, 2021