Metrologies for Quantitative Nanomechanical Testing and Quality Control in Semiconductor Manufacturing

Published

February 1, 2005

Author(s)

Jon R. Pratt, John A. Kramar, David B. Newell, Douglas T. Smith

Abstract

If nanomechanical testing is to evolve into a tool for process and quality control in semiconductor fabrication, great advances in throughout, repeatability, and accuracy of the associated instruments and measurements will be required. A recent grant awarded by the NIST Advanced Technology Program seeks to address the throughput issue by developing a high-speed AFM based platform for quantitative nanomechanical measurements. The following paper speaks to the issue of quantitative accuracy by presenting an overview of various standards and techniques under development at NIST and other national metrology institutes (NMIs) that can provide a metrological basis for nanomechanical testing. The infrastructure we describe places firm emphasis on traceability to the International Systems of Units, paving the way for truly quantitative, rather than qualitative, physical property testing.

Proceedings Title

Proceedings of the 30th SPIE International Symposium, Microlithography

Conference Dates

February 26-March 4, 2005

Conference Location

San Jose, CA

Conference Title

30th SPIE International Symposium, Microlithography

Pub Type

Conferences

Keywords

AFM force calibration, atomic force microscope, Nanomechanical testing, spring constant calibration

Citation

Pratt, J. , Kramar, J. , Newell, D. and Smith, D. (2005), Metrologies for Quantitative Nanomechanical Testing and Quality Control in Semiconductor Manufacturing, Proceedings of the 30th SPIE International Symposium, Microlithography, San Jose, CA (Accessed April 23, 2024)