TY  - CONF
AU  - Jon Pratt
AU  - John Kramar
AU  - David Newell
AU  - Douglas Smith
C2  - Proceedings of the 30th SPIE International Symposium, Microlithography, San Jose, CA
DA  - 2005-02-01
LA  - en
PB  - Proceedings of the 30th SPIE International Symposium, Microlithography, San Jose, CA
PY  - 2005
TI  - Metrologies for Quantitative Nanomechanical Testing and Quality Control in Semiconductor Manufacturing
ER  -