@conference{102391, author = {Jon Pratt and John Kramar and David Newell and Douglas Smith}, title = {Metrologies for Quantitative Nanomechanical Testing and Quality Control in Semiconductor Manufacturing}, year = {2005}, month = {2005-02-01}, publisher = {Proceedings of the 30th SPIE International Symposium, Microlithography, San Jose, CA}, language = {en}, }