Postek, M.
, Keery, W.
and Jones, S.
(1989),
Metrological Electron Microscope for the Certification of Magnification and Linewidth Artifacts for the Semiconductor Industry, Proc. Intl. Soc. for Optical Engineering (SPIE), Integrated Circuit Metrology, Inspection, and Process Control III, Los Angeles, CA, USA
(Accessed December 2, 2024)
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Metrological Electron Microscope for the Certification of Magnification and Linewidth Artifacts for the Semiconductor Industry
Published
Author(s)
, , S. Jones
Proceedings Title
Proc. Intl. Soc. for Optical Engineering (SPIE), Integrated Circuit Metrology, Inspection, and Process Control III
Volume
1087
Conference Dates
February 27-28, 1989
Conference Location
Los Angeles, CA, USA
Pub Type
Conferences
Citation
Issues
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Created December 30, 1989, Updated October 12, 2021