Postek, M.
, Keery, W.
and Jones, S.
(1989),
Metrological Electron Microscope for the Certification of Magnification and Linewidth Artifacts for the Semiconductor Industry, Proc. Intl. Soc. for Optical Engineering (SPIE), Integrated Circuit Metrology, Inspection, and Process Control III, Los Angeles, CA, USA
(Accessed April 18, 2024)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Metrological Electron Microscope for the Certification of Magnification and Linewidth Artifacts for the Semiconductor Industry
Published
Author(s)
, , S. Jones
Proceedings Title
Proc. Intl. Soc. for Optical Engineering (SPIE), Integrated Circuit Metrology, Inspection, and Process Control III
Volume
1087
Conference Dates
February 27-28, 1989
Conference Location
Los Angeles, CA, USA
Pub Type
Conferences
Citation
Created December 30, 1989, Updated October 12, 2021