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Metrological Electron Microscope for the Certification of Magnification and Linewidth Artifacts for the Semiconductor Industry

Published

Author(s)

Michael T. Postek, William J. Keery, S. Jones
Proceedings Title
Proc. Intl. Soc. for Optical Engineering (SPIE), Integrated Circuit Metrology, Inspection, and Process Control III
Volume
1087
Conference Dates
February 27-28, 1989
Conference Location
Los Angeles, CA, USA

Citation

Postek, M. , Keery, W. and Jones, S. (1989), Metrological Electron Microscope for the Certification of Magnification and Linewidth Artifacts for the Semiconductor Industry, Proc. Intl. Soc. for Optical Engineering (SPIE), Integrated Circuit Metrology, Inspection, and Process Control III, Los Angeles, CA, USA (Accessed July 16, 2024)

Issues

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Created December 30, 1989, Updated October 12, 2021