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Methodology for the Certification of Reference Specimens for Determination of Oxygen Concentration in Semiconductor Silicon by Infrared Spectrophotometry

Published

Author(s)

Brian G. Rennex, James R. Ehrstein, Robert I. Scace
Citation
Journal of the Electrochemical Society
Volume
143
Issue
1

Citation

Rennex, B. , Ehrstein, J. and Scace, R. (1996), Methodology for the Certification of Reference Specimens for Determination of Oxygen Concentration in Semiconductor Silicon by Infrared Spectrophotometry, Journal of the Electrochemical Society (Accessed February 28, 2024)
Created December 31, 1995, Updated October 12, 2021