Bagchi, S.
, Lee, J.
, Krause, S.
and Roitman, P.
(1996),
Mechanism of Defect Formation in Low-Dose Oxygen Implanted Silicon-On-Insulator, Journal of Electronic Materials
(Accessed March 13, 2025)
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Mechanism of Defect Formation in Low-Dose Oxygen Implanted Silicon-On-Insulator
Published
Author(s)
S. Bagchi, J. H. Lee, S. J. Krause,
Citation
Journal of Electronic Materials
Volume
25
Issue
1
Pub Type
Journals
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created December 31, 1995, Updated October 12, 2021