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Mechanism of Defect Formation in Low-Dose Oxygen Implanted Silicon-On-Insulator

Published

Author(s)

S. Bagchi, J. H. Lee, S. J. Krause, Peter Roitman
Citation
Journal of Electronic Materials
Volume
25
Issue
1

Citation

Bagchi, S. , Lee, J. , Krause, S. and Roitman, P. (1996), Mechanism of Defect Formation in Low-Dose Oxygen Implanted Silicon-On-Insulator, Journal of Electronic Materials (Accessed February 27, 2024)
Created December 31, 1995, Updated October 12, 2021