Mayo, S.
, Fassett, J.
, Kingston, H.
and Walker, R.
(1990),
Measurement of Vanadium Impurity in Oxygen-Implanted Silicon by Isotope Dilution and Resonance Ionization Mass Spectrometry, Analytical Chemistry
(Accessed December 7, 2024)
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Measurement of Vanadium Impurity in Oxygen-Implanted Silicon by Isotope Dilution and Resonance Ionization Mass Spectrometry
Published
Author(s)
, , H. M. Kingston, R. J. Walker
Citation
Analytical Chemistry
Volume
62
Issue
3
Pub Type
Journals
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created January 31, 1990, Updated October 12, 2021