Schmucker, S.
, Namboodiri, P.
, Kashid, R.
, Wang, X.
, Hu, B.
, Wyrick, J.
, Myers, A.
, Schumacher, J.
, Silver, R.
and Stewart, M.
(2019),
Low-resistance, high-yield electrical contacts to atom scale Si:P devices using palladium silicide, Physical Review Applied, [online], https://doi.org/10.1103/PhysRevApplied.11.034071, https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=926446
(Accessed September 8, 2024)