@article{821606,
  author = {Scott Schmucker and Pradeep Namboodiri and Ranjit Kashid and Xiqiao Wang and Binhui Hu and Jonathan Wyrick and Alline Myers and Joshua Schumacher and Richard Silver and Michael Stewart},
  title = {Low-resistance, high-yield electrical contacts to atom scale Si:P devices using palladium silicide},
  year = {2019},
  number = {11},
  month = {2019-03-29 00:03:00},
  publisher = {Physical Review Applied},
  url = {https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=926446},
  doi = {https://doi.org/10.1103/PhysRevApplied.11.034071},
  language = {en},
}