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Laser Focused Atomic Deposition



Jabez J. McClelland, R E. Scholten, R Gupta, Robert Celotta


We demonstrate the use of a standing-wave laser beam to focus chromium atoms as they deposit onto a silicon surface. A permanent array of Cr lines has been fabricated with line width 65 nm, spacing 213 nm, and height 34 nm. The array covers an area of 0.4 mm x 1 mm, and was deposited in approximately 10 minutes. The lines made in this way constitute a proof-of-principle of an entirely new approach to nanostructure fabrication, with potential for extremely small feature size coupled with massive parallelism.
Proceedings Title
Proceedings of SPIE, Volume 2125, Photochemistry and Processing
No. 3
Conference Dates
January 22-29, 1994
Conference Location
Los Angeles, CA
Conference Title
SPIE, Laser Techniques for Surface Science


atom optics, chromium, laser-focused deposition, nanostructures, surface diffusion, surface growth


McClelland, J. , Scholten, R. , Gupta, R. and Celotta, R. (1994), Laser Focused Atomic Deposition, Proceedings of SPIE, Volume 2125, Photochemistry and Processing, Los Angeles, CA, [online], (Accessed April 14, 2024)
Created January 1, 1994, Updated February 19, 2017