Materer, N.
, Goodman, R.
and Leone, S.
(2000),
Ion-enhanced etching of Si(100) with molecular chlorine: Neutral and ionic product yields as a function of ion kinetic energy and molecular chlorine flux, Journal of Physical Chemistry B
(Accessed April 28, 2024)
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Ion-enhanced etching of Si(100) with molecular chlorine: Neutral and ionic product yields as a function of ion kinetic energy and molecular chlorine flux
Published
Author(s)
N Materer, R S. Goodman,
Citation
Journal of Physical Chemistry B
Volume
104
Pub Type
Journals
Citation
Created December 31, 1999, Updated October 12, 2021