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Ion-enhanced etching of Si(100) with molecular chlorine: Neutral and ionic product yields as a function of ion kinetic energy and molecular chlorine flux

Published

Author(s)

N Materer, R S. Goodman, S R. Leone
Citation
Journal of Physical Chemistry B
Volume
104

Citation

Materer, N. , Goodman, R. and Leone, S. (2000), Ion-enhanced etching of Si(100) with molecular chlorine: Neutral and ionic product yields as a function of ion kinetic energy and molecular chlorine flux, Journal of Physical Chemistry B (Accessed February 23, 2024)
Created December 31, 1999, Updated October 12, 2021