TY  - JOUR
AU  - N Materer
AU  - R Goodman
AU  - S Leone
C2  - Journal of Physical Chemistry B
DA  - 2000-01-01 00:01:00
LA  - en
M1  - 104
PB  - Journal of Physical Chemistry B
PY  - 2000
TI  - Ion-enhanced etching of Si(100) with molecular chlorine: Neutral and ionic product yields as a function of ion kinetic energy and molecular chlorine flux
ER  -