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An Investigation of Particle Dynamics in a Rotating Disk Chemical Vapor Deposition Reactor

Published

Author(s)

D M. Kremer, R W. Davis, Elizabeth F. Moore, James E. Maslar, Donald R. Burgess Jr., S H. Ehrman

Abstract

This paper describes a numerical model for the nucleation, growth and transport of gas phase particles formed during the chemical vapor deposition (CVD) of epitaxial silicon from silane. This model has been constructed for use with the Sandia SPIN code, which contains a solver for the reacting flow and heat transfer in a vertical, rotating disk CVD reactor. A detailed gas phase chemical kinetic mechanism for the thermal decomposition of silane was developed to simulate formation of small silicon clusters and the depletion of reactive intermediates through condensation. The particle model uses a moment transport formulation to examine the effects of total reactor pressure, temperature, rotation rate, inlet gas composition, and rate of particle growth via condensation on the characteristics of the particle population. Numerical results are presented in terms of the integral moments of the particle distribution which correspond physically to the particle number concentration, average particle diameter and particle light scattering intensity. In situ validation experiments have been performed in an optically accessible reactor under conditions typical of silicon CVD. The rate of particle growth via condensation, controlled numerically by a sticking coefficient, was found to control the characteristics of the particle population. The numerical results were found to compare favorably with experiment if this sticking coefficient was properly chosen.
Citation
Journal of the Electrochemical Society
Volume
150
Issue
No. 2

Keywords

aerosol dynamics, chemical vapor deposition, chemically reacting flow, microcontamination, numerical modeling, Raman spectroscopy

Citation

Kremer, D. , Davis, R. , Moore, E. , Maslar, J. , Burgess Jr., D. and Ehrman, S. (2003), An Investigation of Particle Dynamics in a Rotating Disk Chemical Vapor Deposition Reactor, Journal of the Electrochemical Society (Accessed April 15, 2024)
Created January 31, 2003, Updated October 12, 2021