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Intrinsic Birefringence in Crystalline Optical Materials for 193 nm and 157 nm Lithography

Published

Author(s)

J H. Burnett, Zachary H. Levine, Eric L. Shirley, Editors
Citation
Semiconductor Fabtech 15<sup>th</sup>

Citation

Burnett, J. , Levine, Z. and Shirley, E. (2002), Intrinsic Birefringence in Crystalline Optical Materials for 193 nm and 157 nm Lithography, Semiconductor Fabtech 15<sup>th</sup> (Accessed February 26, 2024)
Created December 31, 2001, Updated October 12, 2021