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Intrinsic Birefringence in Crystalline Optical Materials for 193 nm and 157 nm Lithography
Published
Author(s)
J H. Burnett, Zachary H. Levine, Eric L. Shirley, Editors
Citation
Semiconductor Fabtech 15<sup>th</sup>
Pub Type
Journals
Citation
Burnett, J.
, Levine, Z.
and Shirley, E.
(2002),
Intrinsic Birefringence in Crystalline Optical Materials for 193 nm and 157 nm Lithography, Semiconductor Fabtech 15<sup>th</sup>
(Accessed May 28, 2023)