Burnett, J.
, Levine, Z.
and Shirley, E.
(2002),
Intrinsic Birefringence in Crystalline Optical Materials for 193 nm and 157 nm Lithography, Semiconductor Fabtech 15<sup>th</sup>
(Accessed May 4, 2025)
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Intrinsic Birefringence in Crystalline Optical Materials for 193 nm and 157 nm Lithography
Published
Author(s)
J H. Burnett, , , Editors
Citation
Semiconductor Fabtech 15<sup>th</sup>
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Journals
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If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created December 31, 2001, Updated October 12, 2021