Chen, X.
, Albrecht, T.
, Delgadillo, P.
, Dazai, T.
, Nealey, P.
, Kline, R.
, Sunday, D.
, Miyagi, K.
, Maehashi, T.
and Yamazaki, A.
(2020),
The Influence of Additives on the Interfacial Width and Line Edge Roughness in Block Copolymer Lithography, ACS Applied Materials and Interfaces, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=928912
(Accessed February 10, 2025)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
The Influence of Additives on the Interfacial Width and Line Edge Roughness in Block Copolymer Lithography
Published
Author(s)
Xuanxuan Chen, Thomas Albrecht, Paulina R. Delgadillo, Takahiro Dazai, Paul Nealey, , , Ken Miyagi, Takaya Maehashi, Akiyoshi Yamazaki
Citation
ACS Applied Materials and Interfaces
Pub Type
Journals
Download Paper
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created February 24, 2020, Updated October 12, 2021