Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

The Influence of Additives on the Interfacial Width and Line Edge Roughness in Block Copolymer Lithography

Published

Author(s)

Xuanxuan Chen, Thomas Albrecht, Paulina R. Delgadillo, Takahiro Dazai, Paul Nealey, Regis J. Kline, Daniel Sunday, Ken Miyagi, Takaya Maehashi, Akiyoshi Yamazaki
Citation
ACS Applied Materials and Interfaces

Citation

Chen, X. , Albrecht, T. , Delgadillo, P. , Dazai, T. , Nealey, P. , Kline, R. , Sunday, D. , Miyagi, K. , Maehashi, T. and Yamazaki, A. (2020), The Influence of Additives on the Interfacial Width and Line Edge Roughness in Block Copolymer Lithography, ACS Applied Materials and Interfaces, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=928912 (Accessed August 14, 2022)
Created February 24, 2020, Updated October 12, 2021