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The Influence of Additives on the Interfacial Width and Line Edge Roughness in Block Copolymer Lithography

Published

Author(s)

Xuanxuan Chen, Thomas Albrecht, Paulina R. Delgadillo, Takahiro Dazai, Paul Nealey, Regis J. Kline, Daniel Sunday, Ken Miyagi, Takaya Maehashi, Akiyoshi Yamazaki
Citation
ACS Applied Materials and Interfaces

Citation

Chen, X. , Albrecht, T. , Delgadillo, P. , Dazai, T. , Nealey, P. , Kline, R. , Sunday, D. , Miyagi, K. , Maehashi, T. and Yamazaki, A. (2020), The Influence of Additives on the Interfacial Width and Line Edge Roughness in Block Copolymer Lithography, ACS Applied Materials and Interfaces, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=928912 (Accessed March 28, 2024)
Created February 24, 2020, Updated October 12, 2021