Chen, X.
, Albrecht, T.
, Delgadillo, P.
, Dazai, T.
, Nealey, P.
, Kline, R.
, Sunday, D.
, Miyagi, K.
, Maehashi, T.
and Yamazaki, A.
(2020),
The Influence of Additives on the Interfacial Width and Line Edge Roughness in Block Copolymer Lithography, ACS Applied Materials and Interfaces, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=928912
(Accessed March 13, 2025)
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The Influence of Additives on the Interfacial Width and Line Edge Roughness in Block Copolymer Lithography
Published
Author(s)
Xuanxuan Chen, Thomas Albrecht, Paulina R. Delgadillo, Takahiro Dazai, Paul Nealey, , , Ken Miyagi, Takaya Maehashi, Akiyoshi Yamazaki
Citation
ACS Applied Materials and Interfaces
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Journals
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Created February 24, 2020, Updated October 12, 2021