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PUBLICATIONS

The Influence of Additives on the Interfacial Width and Line Edge Roughness in Block Copolymer Lithography

Published

Author(s)

Xuanxuan Chen, Thomas Albrecht, Paulina R. Delgadillo, Takahiro Dazai, Paul Nealey, Regis J. Kline, Daniel Sunday, Ken Miyagi, Takaya Maehashi, Akiyoshi Yamazaki
Citation
ACS Applied Materials and Interfaces
Pub Type
Journals

Download Paper

Local Download
Self-assembly, Polymers and Lithography

Citation

Chen, X. , Albrecht, T. , Delgadillo, P. , Dazai, T. , Nealey, P. , Kline, R. , Sunday, D. , Miyagi, K. , Maehashi, T. and Yamazaki, A. (2020), The Influence of Additives on the Interfacial Width and Line Edge Roughness in Block Copolymer Lithography, ACS Applied Materials and Interfaces, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=928912 (Accessed October 12, 2025)

Issues

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Created February 24, 2020, Updated October 12, 2021
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