An Improved Fast I d -V ^d g Measurement Technology With Expanded Application Range
Chen Wang, Liangchun (. Yu, Jason P. Campbell, Kin P. Cheung, Yi Xuan, Peide Ye, John S. Suehle, David Zhang
Fast Id-Vg measurements on very high performance devices (very low channel ON-resistance) and larger area devices (therefore large gate capacitance) are subject to serious distortions. Methods to minimize these distortions are introduced in this paper; thus expanding the applicable range of this important measurement technique.
2009 IEEE INTERNATIONAL INTEGRATED RELIABILITY WORKSHOP
, Yu, L.
, Campbell, J.
, Cheung, K.
, Xuan, Y.
, Ye, P.
, Suehle, J.
and Zhang, D.
An Improved Fast I<sub> d </sub>-V ^d g Measurement Technology With Expanded Application Range, 2009 IEEE INTERNATIONAL INTEGRATED RELIABILITY WORKSHOP
, Reno, NV, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=904155
(Accessed December 6, 2023)