Dagata, J.
, Farkas, N.
and Ramsier, R.
(2010),
High-voltage Nanoimprint Lithography of Refractory Metal Film, Journal of Nanoscience and Nanotechnology
(Accessed December 2, 2025)
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High-voltage Nanoimprint Lithography of Refractory Metal Film
Published
Author(s)
, , R Ramsier
Abstract
Local oxidation of metal, semiconductor, and polymer surfaces has provided a common basis from which to explore fundamental principles of nanolithography and prototype functional nanostructures for many years now. This article summarizes an investigation of local oxidation for iron and Group IV metal thin films using both scanning probe microscopy and high-voltage nanoimprinting methods. We illustrate how the underlying kinetics of metal oxidation in the presence of nitrogen, which is incorporated into the metal film during the growth process, is dramatically enhanced compared with that of single-crystal silicon. We then go on to demonstrate subsequent selective etching of latent features and a potential magnetic application.Citation
Journal of Nanoscience and Nanotechnology
Volume
10
Pub Type
Journals
Keywords
scanning probe microscopy, nanoimprint lithography, metal-nitride thin films
Citation
Issues
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Created July 1, 2010, Updated February 19, 2017