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High refractive index immersion fluids for 193 nm immersion lithography

Published

Author(s)

B Budhlall, G Parris, P Zhang, X Gao, Z Zarkov, B Ross, Simon G. Kaplan, J Burnett
Citation
SPIE
Volume
5754

Citation

Budhlall, B. , Parris, G. , Zhang, P. , Gao, X. , Zarkov, Z. , Ross, B. , Kaplan, S. and Burnett, J. (2005), High refractive index immersion fluids for 193 nm immersion lithography, SPIE (Accessed December 11, 2023)
Created December 31, 2004, Updated October 12, 2021