High refractive index immersion fluids for 193 nm immersion lithography

B Budhlall; G Parris; P Zhang; X Gao; Z Zarkov; B Ross; Simon G. Kaplan; J Burnett

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PUBLICATIONS

High refractive index immersion fluids for 193 nm immersion lithography

Published

January 1, 2005

Author(s)

B Budhlall, G Parris, P Zhang, X Gao, Z Zarkov, B Ross, Simon G. Kaplan, J Burnett

Citation

SPIE

Volume

5754

Pub Type

Journals

Citation

Budhlall, B. , Parris, G. , Zhang, P. , Gao, X. , Zarkov, Z. , Ross, B. , Kaplan, S. and Burnett, J. (2005), High refractive index immersion fluids for 193 nm immersion lithography, SPIE (Accessed July 14, 2026)

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Created December 31, 2004, Updated October 12, 2021

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