Budhlall, B.
, Parris, G.
, Zhang, P.
, Gao, X.
, Zarkov, Z.
, Ross, B.
, Kaplan, S.
and Burnett, J.
(2005),
High refractive index immersion fluids for 193 nm immersion lithography, SPIE
(Accessed September 18, 2024)
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High refractive index immersion fluids for 193 nm immersion lithography
Published
Author(s)
B Budhlall, G Parris, P Zhang, X Gao, Z Zarkov, B Ross, , J Burnett
Citation
SPIE
Volume
5754
Pub Type
Journals
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created December 31, 2004, Updated October 12, 2021