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High index optical materials for 193 nm immersion lithography

Published

Author(s)

Simon G. Kaplan, J H. Burnett, Eric L. Shirley, D Horowitz, W Clauss, A Grenville, C Van peski
Citation
SPIE
Volume
6154

Citation

Kaplan, S. , Burnett, J. , Shirley, E. , Horowitz, D. , Clauss, W. , Grenville, A. and Van, C. (2006), High index optical materials for 193 nm immersion lithography, SPIE (Accessed March 28, 2024)
Created January 1, 2006, Updated February 17, 2017