Burnett, J.
, Kaplan, S.
, Shirley, E.
, Tompkins, P.
and Webb, J.
(2005),
High-index materials for 193 nm immersion lithography, SPIE
(Accessed October 12, 2024)
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High-index materials for 193 nm immersion lithography
Published
Author(s)
J H. Burnett, , , P J. Tompkins, J E. Webb
Citation
SPIE
Volume
5754
Pub Type
Journals
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created December 31, 2004, Updated October 12, 2021