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High-index materials for 193 nm immersion lithography

Published

Author(s)

J H. Burnett, Simon G. Kaplan, Eric L. Shirley, P J. Tompkins, J E. Webb
Citation
SPIE
Volume
5754

Citation

Burnett, J. , Kaplan, S. , Shirley, E. , Tompkins, P. and Webb, J. (2005), High-index materials for 193 nm immersion lithography, SPIE (Accessed June 24, 2024)

Issues

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Created December 31, 2004, Updated October 12, 2021