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High-index materials for 193 nm immersion lithography
Published
Author(s)
J H. Burnett, Simon G. Kaplan, Eric L. Shirley, P J. Tompkins, J E. Webb
Citation
SPIE
Volume
5754
Pub Type
Journals
Citation
Burnett, J.
, Kaplan, S.
, Shirley, E.
, Tompkins, P.
and Webb, J.
(2005),
High-index materials for 193 nm immersion lithography, SPIE
(Accessed June 2, 2023)