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Generalized ellipsometry of artificially designed line width roughness

Published

Author(s)

Martin Foldyna, Thomas A. Germer, Brent Bergner, Ronald G. Dixson

Abstract

We use azimuthally-resolved spectroscopic Mueller matrix ellipsometry to study a periodic silicon line structure with and without artificially-generated line width roughness (LWR). We model the artificially perturbed grating using 1D and 2D rigorous coupled-wave methods in order to evaluate sensitivity of the experimental spectrally resolved data, measured using a generalized ellipsometer, to the dimensional parameters of LWR. The sensitivity is investigated in the context of multiple conical mounting (azimuth angle) configurations, providing more information about the grating profile.
Citation
Thin Solid Films
Volume
519

Keywords

biperiodic gratings, diffraction gratings, ellipsometry, line width roughness, Mueller matrix, multi-azimuth method, RCWA

Citation

Foldyna, M. , Germer, T. , Bergner, B. and Dixson, R. (2010), Generalized ellipsometry of artificially designed line width roughness, Thin Solid Films, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=906239 (Accessed March 4, 2024)
Created December 10, 2010, Updated February 19, 2017