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Fourier Transform Infrared (FTIR) Determination of Interstitial Oxygen Concentration of Single-Side-Polished Silicon Wafers

Published

Author(s)

Brian G. Rennex
Proceedings Title
Proc. Intl. Soc. for Optical Engineering (SPIE), Fourier Transform Spectroscopy VII
Volume
1145
Conference Dates
June 19-23, 1989
Conference Location
Fairfax, VA

Citation

Rennex, B. (1989), Fourier Transform Infrared (FTIR) Determination of Interstitial Oxygen Concentration of Single-Side-Polished Silicon Wafers, Proc. Intl. Soc. for Optical Engineering (SPIE), Fourier Transform Spectroscopy VII, Fairfax, VA (Accessed April 17, 2024)
Created December 31, 1989, Updated February 17, 2017