Focus and Edge Detection Algorithms and Their Relevance to the Development of an Optical Overlay Calibration Standard

Published

June 1, 1999

Author(s)

S Fox, Mario Dagenais, Edward A. Kornegay, Richard M. Silver

Abstract

We present results of investigations into optical focus and edge detection algorithms relevant to overlay metrology. We compare gradient energy, standard deviation, contrast and summed intensity of acquired images as focus metrics for bright-field, scanning confocal (Nipkow disc), and confocal (single aperture) microscopy. For our purposes, gradient energy calculated via Sobel filtering was found to be the best criterion for an autofocus algorithm. We predicted, based on theoretical results, that all of the focus algorithms we considered will focus in different heights relative to the object depending on the material properties of the object. Edge detection is accomplished via a window and spline technique for whole image (e.g., CCD array) data, and by application of a multiple line regression algorithm for single scan (e.g., photometer) data. Measurements accomplished through these techniques are compared to state of the art scattering and analysis models.

Proceedings Title

Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography XIII, Bhanwar Singh, Editor

Volume

3677

Conference Dates

March 15, 1999

Conference Location

Santa Clara, CA

Conference Title

Registration and Overlay I

Pub Type

Conferences

Keywords

calibration, focus, microscope, overlay metrology, TIS

Citation

Fox, S. , Dagenais, M. , Kornegay, E. and Silver, R. (1999), Focus and Edge Detection Algorithms and Their Relevance to the Development of an Optical Overlay Calibration Standard, Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography XIII, Bhanwar Singh, Editor, Santa Clara, CA (Accessed April 20, 2024)