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Field and Temperature Acceleration of Time-Dependent Dielectric Breakdown in Intrinsic Thin SiO2

Published

Author(s)

John S. Suehle, P Chaparala, C. Messick, W. Wyatt Miller, K. C. Boyko
Proceedings Title
Proc., 1994 IEEE International Reliability Physics Symposium
Conference Dates
April 12-14, 1994
Conference Location
San Jose, CA, USA

Citation

Suehle, J. , Chaparala, P. , Messick, C. , Miller, W. and Boyko, K. (1994), Field and Temperature Acceleration of Time-Dependent Dielectric Breakdown in Intrinsic Thin SiO<sub>2</sub>, Proc., 1994 IEEE International Reliability Physics Symposium, San Jose, CA, USA (Accessed June 6, 2023)
Created December 30, 1994, Updated October 12, 2021